Douglas C. Allan, Corning Incorporated, Corning, New York, U.S.A.
Kiyoshi Asakawa, The Femtosecond Technology Research Association, Japan
Toshihiko Baba, Yokohama National University, Yokohama, Japan
Rana Biswas, Iowa State University, Ames, Iowa, U.S.A.
Kurt Busch, U. of Karlsruhe, Karlsruhe, Germany
Hui Cao, Northwestern University, Evanston, Illinois, U.S.A.
David Cassagne, Université Montpellier II, Montpellier, France
Che Ting Chan, Hong Kong University of Science and Technology, Hong Kong
Dmitry Chigrin, University of Wuppertal, Germany
Gabriel Cwilich, Yeshiva University, U.S.A.
Yoel Fink, Massachusettes Institute of Technology, U.S.A.
Francisco J. Garcia-Vidal, Universidad Autonoma de Madrid, Madrid, Spain
Peter Halevi, INAOE, Puebla, Mexico
Martin Kamp, Wuerzburg University, Germany
Vladimir Kuzmiak, University of California--Irvine, United States
Jordi Martorell, Universitat Politècnica de Catalunya, Terrassa (Barcelona), Spain
Francisco Meseguer, Universidad Politecnica de Valencia, Valencia, Spain
Alexander Moroz, Utrecht University, The Netherlands
Nicole A. Nicorovici, University of Sydney, Sydney, Australia
David J. Norris, NEC Research Institute, Princeton, New Jersey, U.S.A.
Arkadiusz Orlowski, Instytut Fizkyi PAN, Warszawa, Poland
John Page, University of Manitoba, Manitoba, Canada
Albert Polman, FOM Institute for Atomic and Molecular Physics, Amsterdam, The Netherlands
Segrei G. Romanov, University of Wuppertal, Wuppertal, Germany
Joan Jose Saenz Gutierrez, Universidad Autonoma de Madrid, Madrid, Spain
Vladimir Shalaev, New Mexico State University, Las Cruces, NM
M. Sigalas, Ames Laboratory, Iowa State University, Ames, Iowa, U.S.A.
Richart Slusher, Bell Labs, Lucent Technologies, Murray Hill, New Jersey, U.S.A.
David Smith, University of California--San Diego, U.S.A.
Alfons van Blaaderen, Utrecht University, The Netherlands
Bart Van Tiggelen, CNRS/Laboratoire de Physique et modelisation des Systemes Condenses, Grenoble, France
Henry van Driel, AMOLF, The Netherlands
Z. Vardeny, University of Utah, Utah, U.S.A.
Stephanos Venakides, Duke University, United States
Yuri Vlasov, Ioffe Institute of Physics and Technology, Russia
W. Vos, U. of Amsterdam, The Netherlands
R. Wehrspohn, Halle, Germany
Diedrik Wiersma, Florence, Italy
J. P. Woerdman, Leiden University, Leiden, The Netherlands
Z. Q. Zhang, Hong Kong